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Metrology for the manufacturing
of thin films
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Metrology for the manufacturing
of thin films ?

Read about the selected research topic. SRT18i Metrology for the manufacturing of thin films

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Submit Date	Name	Institute	Statement of capabilities/facilities
2010-07-11	Alp Osman KODOLBAS	UME	Distinctive thin film deposition systems with deposition rate controllers for the growth of sensors and photonic devices. Transmission/Reflection, variable angle spectroscopic elipsometer, surface profilometers, characterisation using AFM, SEM, TEM
2010-07-02	Bruno HAY	LNE	Reference metrological facility for the measurement of thermal transport properties of thin films
2010-07-01	Farshid Manoocheri	Aalto University	reflectance/transmittance measurements to determine complex refractive index (and film thickness) for large wavelength range (state of art: Lamminp�� et al, Applied Optics 2006, Nevas et al) --extend wavelength range from 0.25 - 1.6 um => 0.2 - 2.3 um or 3 um --Contribute in developing techniques for in-line systems,for example with several laser beams or white light source for monitoring growth of film thickness for unknown refractive index - traceable reflectance/transmittace measurements of dichroism/fluorescence and birefringence using a high-accuracy gonioreflectometer and goniofluorometer -NOTE: the above is for in-line applications! (we could also provide reference samples) -measurement methods for inhomogeneous thin films --utilize contact to Tikhonravov and make use of Optilayer software